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Properties of intrinsic and doped a-Si:H deposited by remote plasma enhanced chemical vapor deposition
Parsons, G. N.Volume:
6
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.575244
Date:
May, 1988
File:
PDF, 656 KB
english, 1988