Development of atomic radical monitoring probe and its application to spatial distribution measurements of H and O atomic radical densities in radical-based plasma processing
Takahashi, Shunji, Takashima, Seigo, Yamakawa, Koji, Den, Shoji, Kano, Hiroyuki, Takeda, Keigo, Hori, MasaruVolume:
106
Year:
2009
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.3212990
File:
PDF, 428 KB
english, 2009