Interactions between plasmas in ionized physical vapor deposition discharges
Andrew, Y., Lu, Z., Snodgrass, T., Teitzel, G., Wendt, A. E.Volume:
18
Year:
2000
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1286360
File:
PDF, 389 KB
english, 2000