[IEEE 2014 IEEE Symposium on VLSI Technology - Honolulu, HI, USA (2014.6.9-2014.6.12)] 2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers - Statistical demonstration of silicide-like uniform and ultra-low specific contact resistivity using a metal/high-k/Si stack in a sidewall contact test structure
Majumdar, K., Clark, R., Ngai, T., Tapily, K., Consiglio, S., Bersch, E., Matthews, K., Stinzianni, E., Trickett, Y., Nakamura, G., Wajda, C., Leusink, G., Chong, H., Kaushik, V., Woicik, J., Hobbs, CYear:
2014
Language:
english
DOI:
10.1109/vlsit.2014.6894423
File:
PDF, 849 KB
english, 2014