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Preparation of carbonaceous thin films by plasma-assisted chemical vapor deposition and their application to energy devices
Tomokazu Fukutsuka, Yoshiaki Matsuo, Yosohiro Sugie, Takeshi Abe, Zempachi OgumiVolume:
46
Year:
2008
Language:
english
Pages:
2
DOI:
10.1016/j.carbon.2007.11.034
File:
PDF, 37 KB
english, 2008