High resolution ion beam lithography at large gaps using...

Applied Physics Letters 1983 Vol. 42; Iss. 5

High resolution ion beam lithography at large gaps using stencil masks

Randall, J. N.
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Volume:
42
Year:
1983
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.93969
File:
PDF, 473 KB
english, 1983
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