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Streaming and removal forces due to second-order sound field during megasonic cleaning of silicon wafers
Deymier, P. A., Vasseur, J. O., Khelif, A., Djafari-Rouhani, B., Dobrzynski, L., Raghavan, S.Volume:
88
Year:
2000
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1323521
File:
PDF, 452 KB
english, 2000