Modeling of the chemically assisted ion beam etching...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2007 Vol. 25; Iss. 1

Modeling of the chemically assisted ion beam etching process: Application to the GaAs etching by Cl[sub 2]∕Ar[sup +]

Elmonser, L., Rhallabi, A., Gaillard, M., Landesman, J. P., Talneau, Anne, Pommereau, F., Bouadma, N.
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Volume:
25
Year:
2007
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.2400689
File:
PDF, 1.08 MB
english, 2007
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