Direct-write electron beam lithography in silicon dioxide...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2010 Vol. 28; Iss. 5

Direct-write electron beam lithography in silicon dioxide at low energy

Beaumont, Arnaud, Dubuc, Christian, Beauvais, Jacques, Drouin, Dominique
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Volume:
28
Year:
2010
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3478304
File:
PDF, 792 KB
english, 2010
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