Anisotropic etching in inductive plasma source with no rf...

Anisotropic etching in inductive plasma source with no rf biasing

Park, Wontaek
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Volume:
104
Year:
2008
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2979715
File:
PDF, 635 KB
english, 2008
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