Electrical and structural characteristics of yttrium oxide...

Journal of Applied Physics 2003 Vol. 94; Iss. 1

Electrical and structural characteristics of yttrium oxide films deposited by rf-magnetron sputtering on n-Si

Evangelou, E. K., Wiemer, C., Fanciulli, M., Sethu, M., Cranton, W.
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Volume:
94
Year:
2003
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1580644
File:
PDF, 619 KB
english, 2003
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