Lithographic performance evaluation of a contaminated...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2010 Vol. 28; Iss. 4

Lithographic performance evaluation of a contaminated extreme ultraviolet mask after cleaning

George, Simi, Naulleau, Patrick, Okoroanyanwu, Uzodinma, Dittmar, Kornelia, Holfeld, Christian, Wüest, Andrea
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
28
Year:
2010
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3466999
File:
PDF, 1.44 MB
english, 2010
Conversion to is in progress
Conversion to is failed