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Ion beams in silicon processing and characterization
Chason, E., Picraux, S. T., Poate, J. M., Borland, J. O., Current, M. I., Diaz de la Rubia, T., Eaglesham, D. J., Holland, O. W., Law, M. E., Magee, C. W., Mayer, J. W., Melngailis, J., Tasch, A. F.Volume:
81
Year:
1997
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.365193
File:
PDF, 9.51 MB
english, 1997