Nondestructive characterization of nitrogen-implanted...

Journal of Applied Physics 1989 Vol. 66; Iss. 10

Nondestructive characterization of nitrogen-implanted silicon-on-insulator structures by spectroscopic ellipsometry

Fried, M., Lohner, T., de Nijs, J. M. M., van Silfhout, A., Hanekamp, L. J., Laczik, Z., Khanh, N. Q., Gyulai, J.
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Volume:
66
Year:
1989
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.343779
File:
PDF, 853 KB
english, 1989
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