High temperature electron cyclotron resonance etching of GaN, InN, and AlN
Shul, R. J., Kilcoyne, S. P., Hagerott Crawford, M., Parmeter, J. E., Vartuli, C. B., Abernathy, C. R., Pearton, S. J.Volume:
66
Year:
1995
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.113359
File:
PDF, 282 KB
english, 1995