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Dissociation processes in plasma enhanced chemical vapor deposition of SiO[sub 2] films using tetraethoxysilane
Okimura, KunioVolume:
16
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.581514
Date:
November, 1998
File:
PDF, 544 KB
english, 1998