[IEEE 2010 10th IEEE International Conference on...

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[IEEE 2010 10th IEEE International Conference on Solid-State and Integrated Circuit Technology (ICSICT) - Shanghai, China (2010.11.1-2010.11.4)] 2010 10th IEEE International Conference on Solid-State and Integrated Circuit Technology - Improved operation characteristics for charge-trapping flash memory devices with SiGe buried channel and stacked charge-trapping layers

Chang-Liao, Kuei-Shu, Liu, Li-Jung, Ye, Zong-Hao, Keng, Wen-Chun, Wang, Tien-Ko, Gu, Pei-Yi, Tsai, Ming-Jinn
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Year:
2010
Language:
english
DOI:
10.1109/icsict.2010.5667544
File:
PDF, 365 KB
english, 2010
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