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Characterization and versatile applications of low hydrogen content SiOCN grown by plasma-enhanced chemical vapor deposition
Hamm, Steven C., Waidmann, Jacob, Mathai, Joseph C., Gangopadhyay, Keshab, Currano, Luke, Gangopadhyay, ShubhraVolume:
116
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4894843
Date:
September, 2014
File:
PDF, 3.52 MB
english, 2014