E-beam writing: a next-generation lithography approach for...

IEEE Transactions on Magnetics 2002 / 01 Vol. 38; Iss. 1

E-beam writing: a next-generation lithography approach for thin-film head critical features

Fontana, R.E., Katine, J., Rooks, M., Viswanathan, R., Lille, J., MacDonald, S., Kratschmer, E., Tsang, C., Nguyen, S., Robertson, N., Kasiraj, P.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
38
Language:
english
Journal:
IEEE Transactions on Magnetics
DOI:
10.1109/tmag.2002.988918
Date:
January, 2002
File:
PDF, 707 KB
english, 2002
Conversion to is in progress
Conversion to is failed