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E-beam writing: a next-generation lithography approach for thin-film head critical features
Fontana, R.E., Katine, J., Rooks, M., Viswanathan, R., Lille, J., MacDonald, S., Kratschmer, E., Tsang, C., Nguyen, S., Robertson, N., Kasiraj, P.Volume:
38
Language:
english
Journal:
IEEE Transactions on Magnetics
DOI:
10.1109/tmag.2002.988918
Date:
January, 2002
File:
PDF, 707 KB
english, 2002