Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2011 Vol. 29; Iss. 4
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Cryogenic shallow reactive ion etch process for profile control on silicon on insulator platform
Bakhtazad, Aref, Huo, Xuan, Sabarinathan, JayshriVolume:
29
Year:
2011
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3597837
File:
PDF, 2.01 MB
english, 2011