[IEEE IEEE Conference Record - Abstracts. 2005 IEEE International Conference on Plasma Science - Monterey, CA, USA (2005.06.20-2005.06.23)] IEEE Conference Record - Abstracts. 2005 IEEE International Conference on Plasma Science - A New Negative Ion Plasma Source for Material Processing
Fujiwara, Kazuya, Endo, Masakatsu, Ikeda, Yasushi, Shindo, HaruoYear:
2005
Language:
english
DOI:
10.1109/plasma.2005.359141
File:
PDF, 1.18 MB
english, 2005