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Study of particulate formation and its control by a radio frequency power modulation in the reactive ion etching process of SiO2 with CF4/H2 plasma
Yeon, Chung-KyuVolume:
15
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.580478
Date:
January, 1997
File:
PDF, 398 KB
english, 1997