Plasma etching of Hf-based high-k thin films. Part II....

Plasma etching of Hf-based high-k thin films. Part II. Ion-enhanced surface reaction mechanisms

Martin, Ryan M., Blom, Hans-Olof, Chang, Jane P.
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Volume:
27
Year:
2009
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.3065695
File:
PDF, 875 KB
english, 2009
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