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Effects of plasma nitridation of Al[sub 2]O[sub 3] interlayer on thermal stability, fixed charge density, and interfacial trap states of HfO[sub 2] gate dielectric films grown by atomic layer deposition
Park, Hong Bae, Cho, Moonju, Park, Jaehoo, Hwang, Cheol Seong, Lee, Jong-Cheol, Oh, Se-JungVolume:
94
Year:
2003
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1590418
File:
PDF, 457 KB
english, 2003