A study of plasma-film interactions in He/H2, Ar/H2, and Xe/H2 radio frequency sputtered a-Si:H
Albers, M. L., Shinar, J., Shanks, H. R.Volume:
64
Year:
1988
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.341736
File:
PDF, 1.81 MB
english, 1988