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Praseodymium silicate films on Si(100) for gate dielectric applications: Physical and electrical characterization
Lupina, G., Schroeder, T., Dabrowski, J., Wenger, Ch., Mane, A. U., Müssig, H.-J., Hoffmann, P., Schmeisser, D.Volume:
99
Year:
2006
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2202235
File:
PDF, 475 KB
english, 2006