Praseodymium silicate films on Si(100) for gate dielectric...

Praseodymium silicate films on Si(100) for gate dielectric applications: Physical and electrical characterization

Lupina, G., Schroeder, T., Dabrowski, J., Wenger, Ch., Mane, A. U., Müssig, H.-J., Hoffmann, P., Schmeisser, D.

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Volume:

Year:

2006

Language:

english

Journal:

Journal of Applied Physics

DOI:

10.1063/1.2202235

File:

PDF, 475 KB

english, 2006

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