Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2010 Vol. 28; Iss. 1
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Ultralow energy boron implants in silicon characterization by nonoxidizing secondary ion mass spectrometry analysis and soft x-ray grazing incidence x-ray fluorescence techniques
Giubertoni, Damiano, Iacob, Erica, Hoenicke, P., Beckhoff, B., Pepponi, Giancarlo, Gennaro, Salvatore, Bersani, MassimoVolume:
28
Year:
2010
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3292638
File:
PDF, 658 KB
english, 2010