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Energy distributions of positive and negative ions during magnetron sputtering of an Al target in Ar∕O[sub 2] mixtures
Andersson, Jon M., Wallin, E., Münger, E. P., Helmersson, U.Volume:
100
Year:
2006
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2219163
File:
PDF, 667 KB
english, 2006