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Effect of iodotrifluoromethane plasma for reducing...

Effect of iodotrifluoromethane plasma for reducing ultraviolet light irradiation damage in dielectric film etching processes

Ichihashi, Yoshinari, Ishikawa, Yasushi, Shimizu, Ryu, Samukawa, Seiji
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Volume:
28
Year:
2010
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3428541
File:
PDF, 496 KB
english, 2010
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