Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2010 Vol. 28; Iss. 3
Effect of iodotrifluoromethane plasma for reducing ultraviolet light irradiation damage in dielectric film etching processes
Ichihashi, Yoshinari, Ishikawa, Yasushi, Shimizu, Ryu, Samukawa, SeijiVolume:
28
Year:
2010
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3428541
File:
PDF, 496 KB
english, 2010