C[sub 4]F[sub 8] dissociation in an inductively coupled plasma
Radtke, M. T., Coburn, J. W., Graves, David B.Volume:
21
Year:
2003
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1582456
File:
PDF, 698 KB
english, 2003