Residual lattice strain in thin silicon-on-insulator bonded wafers: Effects on electrical properties and Raman shifts
Iida, Tsutomu, Itoh, Takamasa, Noguchi, Daisuke, Takanashi, Yoshifumi, Takano, Yukio, Kanda, YozoVolume:
89
Year:
2001
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1338521
File:
PDF, 344 KB
english, 2001