Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution
Chew, K., Rusli,, Yoon, S. F., Ahn, J., Ligatchev, V., Teo, E. J., Osipowicz, T., Watt, F.Volume:
92
Year:
2002
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1500418
File:
PDF, 332 KB
english, 2002