Removal characteristics of hillock on SnO[sub 2] thin film by chemical mechanical polishing process
Seo, Yong-Jin, Kim, Nam-Hoon, Chang, Eui-Goo, Park, Jinseong, Choi, Gwon-Woo, Lee, Woo-SunVolume:
23
Year:
2005
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1931707
File:
PDF, 418 KB
english, 2005