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Depth profiles of ion-implanted fluorine in tin-oxide films prepared by atmospheric-pressure chemical vapor deposition
Tan, Chunyu, Xia, Yueyuan, Chen, Youpeng, Li, Shuying, Liu, Jitian, Liu, Xiangdong, Xu, Bingzhang, Li, Jinhua, Cao, WenjiangVolume:
73
Year:
1993
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.352806
File:
PDF, 777 KB
english, 1993