Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2011 Vol. 29; Iss. 4
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Optimizing photon sieves to approach Fresnel diffraction limit via pixel-based inverse lithography
Cheng, Mosong, Zhou, ChenggangVolume:
29
Year:
2011
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3605473
File:
PDF, 902 KB
english, 2011