Optimizing photon sieves to approach Fresnel diffraction...

Optimizing photon sieves to approach Fresnel diffraction limit via pixel-based inverse lithography

Cheng, Mosong, Zhou, Chenggang
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Volume:
29
Year:
2011
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3605473
File:
PDF, 902 KB
english, 2011
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