Recovery of time-dependent dielectric breakdown lifetime of thin oxide films by thermal annealing
Furukawa, Taisuke, Yuuki, Akimasa, Ono, KouichiVolume:
82
Year:
1997
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.365662
File:
PDF, 429 KB
english, 1997