Atomic layer-by-layer oxidation of Ge (100) and (111)...

Applied Physics Letters 2013 Vol. 102; Iss. 8

Atomic layer-by-layer oxidation of Ge (100) and (111) surfaces by plasma post oxidation of Al2O3/Ge structures

Zhang, Rui, Huang, Po-Chin, Lin, Ju-Chin, Takenaka, Mitsuru, Takagi, Shinichi
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Volume:
102
Year:
2013
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.4794013
File:
PDF, 919 KB
english, 2013
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