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Roles of N[sub 2] gas in etching of platinum by inductively coupled Ar/Cl[sub 2]/N[sub 2] plasmas
Ryu, Jae-Heung, Kim, Nam-Hoon, Kim, Hyeon-Soo, Yeom, Geun-Young, Chang, Eui-Goo, Kim, Chang-IlVolume:
18
Year:
2000
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.582357
File:
PDF, 391 KB
english, 2000