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[IEEE 2012 IEEE Symposium on VLSI Technology - Honolulu, HI, USA (2012.06.12-2012.06.14)] 2012 Symposium on VLSI Technology (VLSIT) - Segmented-channel Si1−xGex/Si pMOSFET for improved ION and reduced variability
Ho, Byron, Xu, Nuo, Wood, Bingxi, Tran, Vinh, Chopra, Saurabh, Kim, Yihwan, Nguyen, Bich-Yen, Bonnin, Olivier, Mazure, Carlos, Kuppurao, Satheesh, Chang, Chorng-Ping, Liu, Tsu-Jae KingYear:
2012
Language:
english
DOI:
10.1109/vlsit.2012.6242514
File:
PDF, 809 KB
english, 2012