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Self-Aligned Colloidal Lithography for Controllable and Tuneable Plasmonic Nanogaps
Ding, Tao, Herrmann, Lars O., de Nijs, Bart, Benz, Felix, Baumberg, Jeremy J.Volume:
11
Language:
english
Journal:
Small
DOI:
10.1002/smll.201402639
Date:
May, 2015
File:
PDF, 1012 KB
english, 2015