Erratum: “Profile evolution simulator for sputtering and ion-enhanced chemical etching” [J. Vac. Sci. Technol. A 27, 130 (2008)]
Saussac, J., Margot, J., Chaker, M.Volume:
27
Year:
2009
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.3085733
File:
PDF, 302 KB
english, 2009