Feasibility of atomic layer etching of polymer material...

Applied Physics Letters 2013 Vol. 102; Iss. 25

Feasibility of atomic layer etching of polymer material based on sequential O2 exposure and Ar low-pressure plasma-etching

Vogli, Evelina, Metzler, Dominik, Oehrlein, Gottlieb S.
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Volume:
102
Year:
2013
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.4812750
File:
PDF, 985 KB
english, 2013
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