Dynamic pulsed plasma reactor for chemical vapor deposition...

Dynamic pulsed plasma reactor for chemical vapor deposition of advanced materials

Sanner, Mark A., Park, Jin Y.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
68
Year:
1997
Language:
english
Journal:
Review of Scientific Instruments
DOI:
10.1063/1.1147928
File:
PDF, 432 KB
english, 1997
Conversion to is in progress
Conversion to is failed