Hydrogen effects in hydrofluorocarbon plasma etching of...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2011 Vol. 29; Iss. 5

Hydrogen effects in hydrofluorocarbon plasma etching of silicon nitride: Beam study with CF+, CF[sub 2][sup +], CHF[sub 2][sup +], and CH2F+ ions

Ito, Tomoko, Karahashi, Kazuhiro, Fukasawa, Masanaga, Tatsumi, Tetsuya, Hamaguchi, Satoshi
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Volume:
29
Year:
2011
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.3610981
File:
PDF, 575 KB
english, 2011
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