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Film quality in relation to deposition conditions of a‐SI:H films deposited by the ‘‘hot wire’’ method using highly diluted silane
Molenbroek, Edith C., Mahan, A. H., Johnson, E. J., Gallagher, A. C.Volume:
79
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.361445
Date:
May, 1996
File:
PDF, 533 KB
english, 1996