Thermal stability of amorphous LaScO[sub 3] films on silicon
Edge, L. F., Schlom, D. G., Rivillon, S., Chabal, Y. J., Agustin, M. P., Stemmer, S., Lee, T., Kim, M. J., Craft, H. S., Maria, J.-P., Hawley, M. E., Holländer, B., Schubert, J., Eisenbeiser, K.Volume:
89
Year:
2006
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.2222302
File:
PDF, 475 KB
english, 2006