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HBr concentration and temperature measurements in a plasma etch reactor using diode laser absorption spectroscopy
Chou, Shang-I, Baer, Douglas S., Hanson, Ronald K., Collison, Wenli Z., Ni, Tom Q.Volume:
19
Year:
2001
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1342863
File:
PDF, 542 KB
english, 2001