Growth and interface of HfO[sub 2] films on H-terminated Si from a TDMAH and H[sub 2]O atomic layer deposition process
Hackley, Justin C., Demaree, J. Derek, Gougousi, TheodosiaVolume:
26
Year:
2008
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.2965813
File:
PDF, 702 KB
english, 2008