Plasma etching of Hf-based high-k thin films. Part III. Modeling the reaction mechanisms
Martin, Ryan M., Chang, Jane P.Volume:
27
Year:
2009
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.3065705
File:
PDF, 538 KB
english, 2009