[IEEE 2011 Materials for Advanced Metallization (MAM) -...

  • Main
  • [IEEE 2011 Materials for Advanced...

[IEEE 2011 Materials for Advanced Metallization (MAM) - Dresden, Germany (2011.05.8-2011.05.12)] 2011 IEEE International Interconnect Technology Conference - Integrated NiSi defect reductions in 45nm node and beyond

Lai, Jerander, Chen, Yi-Wei, Ho, Nien-Ting, Lin, J. F., Huang, C.C., Wu, J.Y.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Year:
2011
Language:
english
DOI:
10.1109/iitc.2011.5940353
File:
PDF, 259 KB
english, 2011
Conversion to is in progress
Conversion to is failed